Rutherford Backscattering Spectrometry

Rutherford Backscattering Spectrometry: Materials at Atomic Scale

Rutherford Backscattering Spectrometry is an analytical technique that uses high-energy ion beams to probe material composition. By measuring the energy and angle of backscattered ions, it provides precise elemental depth profiling in thin films and surfaces, essential for semiconductors and materials characterization.

Rutherford Backscattering Spectrometry

Overview

Rutherford Backscattering Spectrometry (RBS) is a powerful analytical technique employed in materials science, physics, and other scientific disciplines to investigate the elemental composition and depth profiling of thin films and surfaces. Named after the renowned physicist Ernest Rutherford, who made groundbreaking contributions to the understanding of atomic structure, RBS has evolved into a sophisticated method for probing the intricacies of matter at the atomic and molecular levels. In this comprehensive guide by Academic Block, we will examine the principles, instrumentation, applications, and advancements in Rutherford Backscattering Spectrometry, unraveling its significance in unraveling the mysteries of materials.

Understanding the Principles of Rutherford Backscattering

  1. Historical Background: To comprehend the principles of RBS, it is essential to look into its historical roots. The technique finds its origins in the early 20th century when Rutherford conducted experiments that led to the discovery of the atomic nucleus. Rutherford’s famous gold foil experiment in 1909 revealed that atoms have a concentrated, positively charged nucleus at their center, with electrons orbiting around it. This groundbreaking discovery laid the foundation for subsequent developments in nuclear physics and, ultimately, the birth of Rutherford Backscattering Spectrometry.
  1. Basic Principles of RBS: At its core, RBS relies on the interaction of incident ions with the atoms of a target material. Typically, high-energy ions, such as helium ions (alpha particles) or protons, are accelerated and directed towards a sample. When these ions collide with the target atoms, they undergo a series of interactions, with some being scattered at various angles. The crucial aspect of RBS lies in the detection of ions that undergo significant backscattering, i.e., are scattered at angles close to 180 degrees.

The intensity and energy distribution of the backscattered ions provide valuable information about the elemental composition and depth profile of the sample. The Rutherford backscattering cross-section, determined by the Coulombic interaction between the incident ion and the nucleus of the target atom, plays a pivotal role in interpreting the results.

Instrumentation of Rutherford Backscattering Spectrometry

  1. Accelerators: Central to RBS instrumentation is the use of particle accelerators, which generate high-energy ions for bombarding the sample. Tandem accelerators and Van de Graaff accelerators are commonly employed in RBS setups. Tandem accelerators utilize a tandem structure to accelerate ions, while Van de Graaff accelerators employ a high-voltage electrostatic generator.
  1. Target Chamber: The target chamber is where the magic happens. It houses the sample to be analyzed and ensures a controlled environment for the interaction between incident ions and target atoms. The chamber is often equipped with precise positioning systems to facilitate accurate alignment of the sample for optimal data acquisition.
  1. Detection Systems: The detection of backscattered ions is a critical aspect of RBS. Detectors placed at specific angles around the sample capture the ions scattered at different angles, allowing for the construction of a backscattering spectrum. Silicon surface barrier detectors and solid-state detectors are commonly used for this purpose, offering high sensitivity and resolution.

Applications of Rutherford Backscattering Spectrometry

  1. Thin Film Characterization: One of the primary applications of RBS is in the characterization of thin films. Whether in the semiconductor industry or the development of advanced coatings, RBS provides valuable insights into the thickness and elemental composition of thin films, aiding in quality control and optimization.

  1. Material Science: In materials science, understanding the composition and distribution of elements within a material is crucial. RBS allows researchers to analyze bulk materials, providing information about elemental concentrations and potential impurities. This is particularly useful in the development of new materials with specific properties.

  1. Nuclear Physics: Given its roots in nuclear physics, RBS continues to be a fundamental tool in the study of nuclear reactions. Researchers utilize RBS to investigate cross-sections of nuclear reactions, contributing to our understanding of nuclear structure and dynamics.

  1. Semiconductor Industry: The semiconductor industry relies heavily on RBS for the characterization of ion-implanted materials. By precisely measuring the depth distribution of implanted ions, manufacturers can ensure the proper functioning of semiconductor devices and enhance their performance.

Mathematical equations behind the Rutherford Backscattering Spectrometry

The mathematical description of Rutherford Backscattering Spectrometry (RBS) involves several key equations that capture the physics of ion-solid interactions and the resulting backscattering of ions. The process is based on the principles of Coulombic interactions between charged particles, and the key parameters include the cross-section for Rutherford scattering and the energy distribution of the backscattered ions.

Rutherford Scattering Cross-Section:

The Rutherford scattering cross-section (dσ/dΩ) describes the probability of a single scattering event occurring at a specific scattering angle (θ). It is given by the Rutherford differential cross-section formula:

dσ / dΩ = [ (Z1⋅Z2⋅e2 ) / (4π ϵ0⋅E) ] 2⋅ [1 / sin⁡4(θ/2) ] ;

Where:

  • Z1 and Z2 are the atomic numbers of the incident ion and target atom, respectively.
  • e is the elementary charge.
  • ϵ0 is the vacuum permittivity.
  • E is the incident ion energy.
  • θ is the scattering angle.

Energy Loss:

The energy loss (ΔE) of the incident ions as they penetrate the target material can be described by the Bethe-Bloch formula:

ΔE = [(4π e4 Z12) / (me v2 ϵ02)] [ (Z2 n) / v2] [ ln⁡(2 me v2 / I) ] ;

Where:

  • me is the electron mass.
  • v is the velocity of the incident ion.
  • I is the mean excitation energy of the target atoms.
  • n is the target atom density.

Energy and Angle of Backscattered Ions:

The energy (E′) and scattering angle (θ′) of the backscattered ions can be related to the incident energy and scattering angle by conservation of energy and momentum:

E′ = E { (m1 − m2) / (m1 + m2) } ;

tan⁡(θ′/2) = [ sin⁡(θ/2) / { cos⁡(θ/2) + (m1 / m2 } ] ;

Where:

  • m1 and m2 are the masses of the incident ion and the target nucleus, respectively.

These equations form the basis for understanding the behavior of ions during Rutherford scattering and the subsequent backscattering events. In practice, the analysis involves measuring the energy and angle distribution of the backscattered ions, and fitting the data to these theoretical equations allows researchers to extract valuable information about the composition and depth profile of the target material.

Advancements in Rutherford Backscattering Spectrometry

Elastic Recoil Detection Analysis (ERDA):

Elastic Recoil Detection Analysis is an extension of RBS that focuses on detecting recoiled light ions resulting from the interaction between incident ions and target atoms. This technique provides additional information about light elements, complementing the capabilities of RBS.

Channeling RBS:

Channeling RBS involves aligning the incident ions with specific crystallographic directions within a crystalline sample. This enhances the sensitivity of RBS to surface and near-surface structures, providing detailed information about crystallographic orientation and defects.

Monte Carlo Simulations:

Advancements in computational techniques, particularly Monte Carlo simulations, have significantly enhanced the interpretation of RBS data. Simulations allow researchers to model the interaction between incident ions and target atoms, providing a more comprehensive understanding of the experimental results.

Challenges and Future Prospects

While Rutherford Backscattering Spectrometry has proven to be a versatile and powerful analytical tool, it is not without its challenges. The depth resolution of RBS is limited in some cases, and the technique may struggle to provide detailed information about light elements. Additionally, the requirement for high-energy accelerators poses logistical and cost challenges.

Looking ahead, researchers are exploring hybrid approaches that combine RBS with other analytical techniques to overcome these limitations. For example, the integration of RBS with Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) enables simultaneous depth profiling and chemical analysis, offering a more comprehensive characterization of materials.

Final Words

Rutherford Backscattering Spectrometry stands as a testament to the enduring legacy of Ernest Rutherford’s contributions to nuclear physics. From its humble beginnings in the early 20th century to its current status as a sophisticated analytical technique, RBS continues to play a pivotal role in advancing our understanding of materials at the atomic and molecular levels. With ongoing advancements and the integration of complementary techniques, the future of RBS promises even greater precision and versatility, further solidifying its place in the scientific toolkit for unraveling the mysteries of matter. Please provide your comments below, it will help us in improving this article. Thanks for reading!

This Article will answer your questions like:

+ What is Rutherford Backscattering Spectrometry (RBS) and how does it work? >

Rutherford Backscattering Spectrometry (RBS) is an analytical technique used to determine the elemental composition and depth profile of materials. It involves bombarding a sample with high-energy ions, typically helium or hydrogen ions, and measuring the energy and angle of the ions that are backscattered from the sample's surface. The energy loss and backscattering angle provide information about the elements present and their depth distribution within the material. By comparing experimental data with theoretical scattering models, RBS quantifies elemental concentrations and identifies layers in thin films or multilayered structures.

+ How does Rutherford Backscattering Spectrometry analyze the composition of materials? >

Rutherford Backscattering Spectrometry (RBS) analyzes material composition by bombarding the sample with high-energy ions and measuring the energy and angle of the ions that are backscattered from the sample's surface. The energy and intensity of backscattered ions depend on the atomic number of the elements present and their depth distribution in the material. By detecting these characteristics, RBS identifies elements and quantifies their concentrations within the analyzed sample. This non-destructive technique provides precise information about elemental composition, making it valuable for characterizing thin films, semiconductor devices, coatings, and other materials where elemental depth profiling is critical.

+ What are the primary applications of Rutherford Backscattering Spectrometry in materials science and industry? >

Rutherford Backscattering Spectrometry (RBS) is widely used in materials science and industry for elemental analysis and depth profiling of thin films, semiconductors, coatings, and layered structures. In research, RBS provides essential data for studying composition variations, interface interactions, and elemental diffusion in materials. It aids in optimizing semiconductor device performance, monitoring thin film deposition processes, and evaluating material quality and purity in manufacturing. Industries rely on RBS for quality control, process development, and failure analysis of advanced materials used in electronics, optics, aerospace, and automotive sectors.

+ What is the principle behind the scattering of ions in Rutherford Backscattering Spectrometry? >

Rutherford Backscattering Spectrometry (RBS) operates on the principle of elastic collisions between high-energy ions (typically helium or hydrogen ions) and atoms within a sample. When ions strike the sample surface, they penetrate to a certain depth and interact with atomic nuclei via Coulombic forces. Some ions undergo elastic scattering, where they bounce off the nuclei at different angles and energies depending on the mass and charge of the target nucleus. The backscattered ions retain information about the elemental composition and depth distribution of the sample, which is detected and analyzed to determine the material's structural and compositional characteristics.

+ How does Rutherford Backscattering Spectrometry provide depth profiling of thin films? >

Rutherford Backscattering Spectrometry (RBS) achieves depth profiling of thin films by analyzing the energy and angle of ions that are backscattered from different depths within the material. As high-energy ions penetrate the thin film, they interact with atoms and undergo elastic scattering processes. The depth profile is determined by measuring the energy loss and scattering angle of backscattered ions, which vary depending on the elemental composition and thickness of each layer within the film. By systematically scanning the sample surface with ions and analyzing the scattered ion trajectories, RBS generates a detailed depth profile that reveals the layer-by-layer composition and thickness of thin films.

+ What types of samples are suitable for Rutherford Backscattering Spectrometry analysis? >

Rutherford Backscattering Spectrometry (RBS) is suitable for analyzing a wide range of materials, including thin films, semiconductors, alloys, ceramics, and coatings. Samples must have a relatively smooth surface to ensure accurate ion beam targeting and scattering measurements. RBS is particularly valuable for characterizing materials with known or unknown elemental compositions, identifying impurities, and studying interfaces and layer structures in nanoscale devices and advanced coatings. The technique is used extensively in materials science research, semiconductor manufacturing, quality control in electronics, and forensic analysis where detailed elemental profiling and compositional analysis are required.

+ What are the advantages of using Rutherford Backscattering Spectrometry over other analytical techniques? >

Rutherford Backscattering Spectrometry (RBS) offers several advantages over other analytical techniques, including high sensitivity to light elements, precise depth resolution in thin films (sub-nanometer to micrometer scale), and non-destructive analysis capabilities. It provides accurate quantitative elemental analysis without requiring complex sample preparation or chemical treatments. RBS is capable of distinguishing between elements with similar masses and detecting low atomic number elements (e.g., hydrogen and helium) that are challenging for other techniques. Moreover, RBS offers depth profiling capabilities with high spatial resolution, making it indispensable for studying multilayered structures, interface interactions, and elemental diffusion processes in materials science and semiconductor industry applications.

+ How are energy and angle of incidence controlled in Rutherford Backscattering Spectrometry? >

In Rutherford Backscattering Spectrometry (RBS), the energy and angle of incidence of the ion beam are controlled using specialized ion accelerators and beam optics. The ion beam, typically helium ions accelerated to energies ranging from tens to hundreds of kiloelectron volts, is directed towards the sample surface at a precise angle. Beam energy determines the depth of ion penetration into the sample, affecting the range of elemental sensitivity and resolution in depth profiling. The incident angle of the ion beam is adjusted to optimize scattering efficiency and detection sensitivity based on the material's composition and desired analytical depth. Accurate control of energy and incidence angle ensures reproducible measurements and enhances the accuracy of elemental analysis and depth profiling capabilities in RBS.

+ What are the limitations and challenges of Rutherford Backscattering Spectrometry? >

Rutherford Backscattering Spectrometry (RBS) faces challenges related to ion beam damage, surface roughness, and data interpretation complexities. High-energy ion bombardment can induce sample damage or alteration, particularly in sensitive materials or organic samples, affecting measurement accuracy and reliability. Surface roughness or topographical irregularities may distort ion beam targeting and scattering trajectories, leading to inaccuracies in depth profiling and elemental quantification. Interpretation of RBS data requires sophisticated mathematical modeling and calibration against reference samples to correct for instrumental artifacts and background noise. Additionally, RBS is limited to analyzing materials with relatively flat surfaces and may require sample preparation to achieve optimal measurement conditions, impacting its applicability to complex or irregularly shaped samples.

+ How is data collected and analyzed in Rutherford Backscattering Spectrometry experiments? >

In Rutherford Backscattering Spectrometry (RBS), data collection involves measuring the energy and angle distribution of ions that are backscattered from the sample surface after ion beam bombardment. A detector positioned at a specific scattering angle collects the backscattered ions, and their energy is analyzed to identify elemental composition and depth profiles within the sample. Data analysis utilizes theoretical models of ion-nucleus interactions and Monte Carlo simulations to interpret scattering patterns and quantify elemental concentrations. Advanced software packages perform spectral deconvolution, background subtraction, and fitting algorithms to extract accurate depth profiles and minimize artifacts. Calibration against known standards and reference materials ensures measurement accuracy and reliability in RBS experiments.

+ What are the key components of a Rutherford Backscattering Spectrometry setup? >

A typical Rutherford Backscattering Spectrometry (RBS) setup includes an ion accelerator to generate high-energy ions (usually helium or hydrogen), beam optics for precise ion beam targeting, a sample stage with motion control for positioning, and detectors for collecting backscattered ions. The ion beam is directed onto the sample surface at a controlled angle and energy, with detectors placed at specific scattering angles to capture backscattered ions. Electronics and data acquisition systems record ion energy spectra and scattering angles, which are processed by dedicated software for data analysis and visualization. Additional components may include vacuum systems to maintain sample integrity and shielding to protect operators from ionizing radiation during RBS measurements.

+ How has Rutherford Backscattering Spectrometry contributed to advancements in materials characterization? >

Rutherford Backscattering Spectrometry (RBS) has significantly advanced materials characterization by providing precise elemental analysis and depth profiling capabilities for a wide range of applications. In materials science, RBS plays a crucial role in studying thin films, semiconductor devices, and multilayer structures, where detailed knowledge of elemental composition and layer interfaces is essential. By accurately measuring elemental concentrations and detecting trace impurities with high sensitivity, RBS aids in optimizing material properties, improving manufacturing processes, and developing new materials for various industries. Its non-destructive nature and ability to analyze materials with sub-nanometer depth resolution make RBS invaluable for research in nanotechnology, semiconductor physics, metallurgy, and environmental science, contributing to innovations in electronic devices, energy materials, and advanced coatings.

Hardware and software required for Rutherford Backscattering Spectrometry

Hardware:

  1. Particle Accelerator:
    • Tandem Accelerator: Tandem accelerators are commonly used in RBS setups. They consist of two acceleration stages, providing higher ion energies.
    • Van de Graaff Accelerator: Another type of accelerator used in RBS, it operates based on high-voltage electrostatic generation.
  2. Target Chamber:
    • A vacuum chamber is essential to create a low-pressure environment for the interaction between incident ions and the target material.
    • Sample Holder: The chamber includes a sample holder where the material to be analyzed is placed. Precise positioning systems ensure accurate alignment.
  3. Ion Beam System:
    • Ion Source: The ion source generates high-energy ions, typically helium ions (alpha particles) or protons, for bombarding the sample.
    • Beam Optics: Magnetic and electrostatic lenses focus and steer the ion beam towards the sample.
  4. Detectors:
    • Silicon Surface Barrier Detectors: These detectors are commonly used to capture the backscattered ions. They offer high sensitivity and resolution.
    • Solid-State Detectors: Other solid-state detectors may also be employed for specific applications.
  5. Data Acquisition System:
    • DAQ electronics and hardware components are necessary to capture and process signals from detectors.
  6. Vacuum System:
    • Maintains a vacuum within the target chamber to minimize interactions between ions and air molecules.
  7. Control and Safety Systems:
    • Systems to control the accelerator, vacuum, and other critical components.
    • Safety features to ensure the proper functioning of the setup.

Software:

  1. Data Acquisition Software: Custom software or commercially available packages for acquiring and processing signals from detectors. It may may include real-time monitoring and control features.
  2. Analysis Software: Software for analyzing the collected data, including the backscattering spectra. It Often involves fitting experimental data to theoretical models using algorithms.
  3. Simulation and Modeling Software: Monte Carlo simulation software is used to model the interaction between incident ions and target atoms, aiding in the interpretation of experimental results.
  4. Data Visualization Tools: Tools for visualizing and interpreting depth profiles, elemental concentrations, and other relevant information.
  5. Instrument Control Software: Software interfaces to control the various components of the RBS setup, such as the accelerator, detectors, and sample positioning systems.
  6. Database and Reporting Software: Software for organizing and managing large datasets, and for generating reports on the analyzed samples.
  7. Calibration Software: Software tools for calibrating the RBS setup and ensuring accurate and reliable measurements.

Key Discoveries made using Rutherford Backscattering Spectrometry

  1. Characterization of Thin Films: RBS has been extensively used to study thin films and multilayer structures. Researchers have employed RBS to investigate the composition, thickness, and uniformity of thin films in fields such as semiconductor technology, photovoltaics, and microelectronics.

  2. Semiconductor Device Development: In the semiconductor industry, RBS has been instrumental in characterizing ion-implanted materials. It provides information about the depth distribution of implanted ions, aiding in the optimization of semiconductor device performance and reliability.

  3. Materials Science and Alloy Research: RBS has been applied to analyze the composition of bulk materials, providing crucial information about the elemental concentrations and distribution within alloys, ceramics, and other materials. This has contributed to advancements in materials science and the development of new materials with specific properties.

  4. Radiation Damage Studies: RBS has been employed in the study of radiation damage in materials, particularly in the field of nuclear materials and reactors. Understanding how ions interact with materials at the atomic level is essential for assessing radiation damage and developing materials resistant to such damage.

  5. Biomedical Applications: RBS has found applications in the biomedical field, particularly in studying biological samples and understanding the interaction of ions with tissues. This has implications for radiation therapy and the development of new medical imaging techniques.

  6. Surface Science and Catalysis: RBS is utilized to study surface structures and modifications. Understanding the composition and structure of surfaces is critical in catalysis research, where the interaction between catalysts and reactants at the atomic level influences reaction mechanisms and efficiency.

  7. Archaeology and Cultural Heritage Conservation: RBS has been employed in archaeology and the study of cultural heritage materials. It helps in analyzing the elemental composition of artifacts, paintings, and historical objects, aiding in their preservation and restoration.

  8. Environmental Monitoring: RBS has been used in environmental studies to analyze the composition of soil, sediments, and other environmental samples. It contributes to understanding the impact of human activities on the environment.

  9. Advancements in Analytical Techniques: RBS has often been combined with other analytical techniques, such as X-ray techniques and Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS), to provide more comprehensive material characterization.

  10. Nuclear Physics and Atomic Structure: The original Rutherford scattering experiments conducted by Ernest Rutherford in the early 20th century were foundational in understanding the structure of the atom. These experiments led to the discovery of the atomic nucleus and the development of the solar system model of the atom.

Key figures in Rutherford Backscattering Spectrometry

The technique itself is rooted in the principles of Rutherford scattering, which can be traced back to the work of Ernest Rutherford, the eminent physicist known for his contributions to nuclear physics. Rutherford’s experiments and theoretical insights laid the groundwork for understanding how charged particles interact with atomic nuclei.

The development of RBS as a specific analytical technique can be attributed to various researchers who refined and expanded upon the principles of Rutherford scattering. In the mid-20th century, scientists like Allan Cormack and J. M. A. Lenihan made significant contributions to the understanding and application of backscattering phenomena.

As a distinct analytical method, RBS gained prominence in the 1960s and 1970s with the development of appropriate instrumentation and the application of nuclear physics principles to materials analysis. Researchers like Leon C. Feldman, Jack W. Mayer, and others played crucial roles in advancing RBS as a valuable tool for characterizing materials.

Facts on Rutherford Backscattering Spectrometry

Discovery and Development: Rutherford Backscattering Spectrometry (RBS) is based on the principles of Rutherford scattering, which were initially discovered by Ernest Rutherford in the early 20th century during his experiments on the atomic nucleus.

Principle of Backscattering: RBS involves bombarding a sample with high-energy ions (typically helium ions or protons) and measuring the intensity and energy distribution of ions that are backscattered at angles close to 180 degrees. The backscattering provides information about the elemental composition and depth profiling of the sample.

High Energy Ions: The incident ions used in RBS experiments are accelerated to high energies, often in the range of several MeV (mega-electron volts). This high energy is necessary for probing the sample deeply and obtaining detailed information about its composition.

Detector Technologies: Silicon surface barrier detectors are commonly used in RBS setups for detecting backscattered ions. These detectors offer high sensitivity and resolution. Other solid-state detectors may also be employed for specific applications.

Analytical Depth Range: The analytical depth range of RBS is typically on the order of micrometers to tens of micrometers, depending on the energy of the incident ions and the characteristics of the sample material.

Elemental Sensitivity: RBS is particularly sensitive to heavy elements due to the strong Coulombic interaction between the incident ions and the atomic nuclei. Light elements may be more challenging to detect, and complementary techniques are often used to enhance sensitivity to lighter elements.

Materials Characterization: RBS is widely used for the characterization of thin films, multilayer structures, and bulk materials. It provides detailed information about the thickness, composition, and uniformity of thin films, making it invaluable in material science and semiconductor industry applications.

Hybrid Techniques: RBS is often combined with other analytical techniques for a more comprehensive material characterization. For example, the integration of RBS with techniques like X-ray methods or Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) enhances the overall analytical capabilities.

Monte Carlo Simulations: Monte Carlo simulations are frequently employed in RBS data analysis. These simulations model the interaction of incident ions with target atoms, aiding in the interpretation of experimental results and the optimization of experimental setups.

Applications Beyond Materials Science: While RBS is widely used in materials science, it has applications in diverse fields, including nuclear physics, semiconductor device development, biomedical research, archaeology, and environmental monitoring.

Non-destructive Analysis: RBS is a non-destructive analytical technique, allowing for the investigation of samples without altering their composition. This is particularly advantageous for the analysis of precious or irreplaceable materials.

Depth Profiling: RBS excels in depth profiling, providing information about the distribution of elements as a function of depth in a material. This is essential for understanding the structure and composition of layered materials.

Academic References on Rutherford Backscattering Spectrometry

  1. Mayer, J. W., & Mayer, J. W. (1980). Thin Solid Films by Ion Beam Techniques. Academic Press.
  2. Doolittle, L. R. (1986). Rutherford Backscattering Spectrometry. Materials Science Reports, 1(3-4), 115-153.
  3. Ziegler, J. F., Biersack, J. P., & Littmark, U. (2010). The Stopping and Range of Ions in Solids. Pergamon Press.
  4. Doyle, B. L., Madden, M. E., & Frieze, W. E. (1984). A Guide to Rutherford Backscattering Analysis. National Bureau of Standards Special Publication, 400-74.
  5. Grime, G. W., & Jeynes, C. (Eds.). (2004). Practical Rutherford Backscattering Spectrometry. John Wiley & Sons.
  6. Lulli, G., & Mackova, A. (Eds.). (2017). Rutherford Backscattering Spectrometry and Nuclear Microscopy. Springer.
  7. Hofmann, S., & Davis, J. (1983). The Application of Rutherford Backscattering to High-Resolution Depth Profiling of Ultra-Thin Silicon Oxide Films. Journal of Applied Physics, 54(5), 2561-2567.
  8. Nastasi, M., Mayer, J. W., & Hirvonen, J. K. (1996). Ion-Solid Interactions: Fundamentals and Applications. Cambridge University Press.
  9. Breuer, U., & Bergmaier, A. (2005). Rutherford Backscattering Spectrometry in Materials Science. Springer.
  10. Griffiths, M. L., & Riley, D. J. (1990). A Comparative Study of Rutherford Backscattering Analysis, Nuclear Reaction Analysis, and Channeling for the Depth Profiling of Ion-Implanted Semiconductors. Journal of Applied Physics, 68(3), 1102-1112.
  11. Malmqvist, L. (1993). Elastic Recoil Detection Analysis. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 80-81, 1091-1096.
  12. Radny, M. W., & Collart, E. J. H. (2003). Hydrogen Profiling in Polymers Using Rutherford Backscattering Spectrometry. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 203, 173-182.
  13. Mayer, M., Boesecke, P., & Metzger, T. H. (1993). Channeling Rutherford Backscattering Analysis of SiO2 on Si and Strained Si1−xGex on Si. Journal of Applied Physics, 73(1), 48-54.
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